|
| AES |
Auger electron spectroscopy |
| AFM |
Atomic force microscopy |
| EDS / EDX |
Energy dispersive spectrometry |
| EDX / EDS |
Energy dispersive X-ray |
| EELS |
Electron energy loss spectroscopy |
| EID |
Electron induced desorption |
| ESCA / XPS |
Electron spectroscopy for chemical analysis |
| GDOS |
Glow discharge optical spectroscopy |
| ISS |
Ion scattering spectroscopy |
| LAMMA |
Laser microprobe mass analysis |
| LEED |
Low energy electron diffration |
| PEEM |
Photo emission electron microscopy |
| REM / SEM |
Raster-Elektronenmikroskopie |
| RBS |
Rutherford backscattering |
| RFA |
X-ray fluoroscence analysis |
| RHEED |
Reflection high-energy electron diffraction |
| SAM |
Scanning auger mircroprobe |
| SE |
Secondary electron |
| SEM / REM |
Scanning electron microscopy |
| SIMS |
Secondary ion mass spectroscopy |
| SNMS |
Secondary neutral mass spectroscopy |
| TEM |
Transmission electron mikroscopy |
| ToF-SIMS |
Time of flight SIMS |
| UPS |
Ultraviolet photoelectron spectroscopy |
| WDX / WDS |
Wavelength dispersive analysis of X-ray |
| XPS / ESCA |
X-ray photoelectron spectroscopy |
| ZAF |
Atomic number, absorption, and fluoroscence
correctionis pattern |
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